Substrate processing apparatus and substrate processing method

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United States of America Patent

PATENT NO 9993840
APP PUB NO 20160310979A1
SERIAL NO

15133685

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Positions of an outer periphery of a rotating substrate and a processing liquid nozzle are detected. An amplitude of a change with time of the position of the outer periphery of the substrate detected during rotation is acquired. In a direction passing through a rotational center and parallel with the rotating substrate, a relative position of the processing liquid nozzle with respect to the spin chuck is periodically changed at a frequency equal to a rotational frequency of the spin chuck and the acquired amplitude. A difference between a phase of a change with time of the position of the processing liquid nozzle and a phase of a change with time of the position of the outer periphery of the substrate is adjusted to not more than a predetermined value. A processing liquid is discharged from the processing liquid nozzle to a peripheral portion of the rotating substrate.

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Patent Owner(s)

  • SCREEN HOLDINGS CO., LTD.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Inagaki, Yukihiko Kyoto, JP 32 439

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