Slurry composition for polishing tungsten

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United States of America Patent

PATENT NO 9994735
SERIAL NO

15189190

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Abstract

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A slurry composition for polishing tungsten is provided. The slurry composition for polishing tungsten may include a water-soluble polymer, abrasive particles and an etching adjuster.

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Patent Owner(s)

Patent OwnerAddress
KCTECH CO LTDGYEONGGI-DO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hwang, Jin Sook Anseong-si, KR 5 2
Kong, Hyun Goo Anseong-si, KR 10 15
Park, Han Teo Anseong-si, KR 19 3

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