Raw material vaporization and supply apparatus

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United States of America Patent

APP PUB NO 20150322567A1
SERIAL NO

14650496

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Abstract

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The present invention provides a raw material vaporization and supply device including a raw material receiving tank, a vaporizer for vaporizing liquid pressure-fed from the liquid receiving tank, a flow rate control device for adjusting a flow rate of raw material gas from the vaporizer, and a heating device for heating the vaporizer, the high-temperature pressure-type flow rate control device, and desired sections of flow passages connected to these devices, wherein Al2O3 passivation treatment, Cr2O3 passivation treatment, or FeF2 passivation treatment is applied to liquid contact parts or gas contact parts of metal surfaces of at least any of the raw material receiving tank, the vaporizer, the flow rate control device, the flow passages that links these component devices, or opening-and-closing valves that are disposed in the flow passages.

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Patent Owner(s)

Patent OwnerAddress
FUJIKIN INCORPORATED3-2 ITACHIBORI 2-CHOME NISHI-KU OSAKA-SHI OSAKA 550-0012

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hidaka, Atsushi Osaka, JP 20 86
Ikeda, Nobukazu Osaka, JP 205 2613
Nagase, Masaaki Osaka, JP 70 549
Nishino, Kouji Osaka, JP 132 1281
Yamashita, Satoru Osaka, JP 16 294

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