Reflective optical element and optical system for EUV lithography

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United States of America Patent

PATENT NO 9996005
SERIAL NO

14082865

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Abstract

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In order to reduce the negative influence of reactive hydrogen on the lifetime of a reflective optical element, particularly inside an EUV lithography device, there is proposed for the extreme ultraviolet and soft X-ray wavelength region a reflective optical element (50) having a reflective surface (60) with a multilayer system (51) and in the case of which the reflective surface (60) has a protective layer system (59) with an uppermost layer (56) composed of silicon carbide or ruthenium, the protective layer system (59) having a thickness of between 5 nm and 25 nm.

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Patent Owner(s)

Patent OwnerAddress
CARL ZEISS SMT GMBHRUDOLF-EBER-STRASSE 2 OBERKOCHEN 73447

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ehm, Dirk Heinrich Lauchheim, DE 48 350
Huber, Peter Holzschwang, DE 68 645
Muellender, Stephan Aalen, DE 18 136
Von, Blanckenhagen Gisela Aalen, DE 11 82

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