EUV-mirror, optical system with EUV-mirror and associated operating method

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 9997268
APP PUB NO 20160379730A1
SERIAL NO

15262272

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Abstract

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An EUV mirror (1000) has a mirror element which forms a mirror surface of the mirror. The mirror element has a substrate (1020) and a multilayer arrangement (1030) applied on the substrate and having a reflective effect with respect to radiation from the extreme ultraviolet range (EUV). The multilayer arrangement has a multiplicity of layer pairs having alternate layers composed of a high refractive index layer material and a low refractive index layer material, has an active layer (1040) arranged between a radiation entrance surface and the substrate and consisting of a piezoelectrically active layer material, the layer thickness (z) of which active layer can be altered by the action of an electric field, and has an electrode arrangement to generate the electric field acting on the active layer.

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Patent Owner(s)

Patent OwnerAddress
CARL ZEISS SMT GMBHRUDOLF-EBER-STRASSE 2 OBERKOCHEN 73447

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bayraktar, Muharrem Enschede, NL 3 21
Bijkerk, Frederik Bosch en Duin, NL 27 281
Dier, Oliver Lauchheim, DE 13 33
Dinger, Udo Oberkochen, DE 55 998

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