Polishing device and polishing method
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United States of America Patent
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Jun 19, 2018
Issued Date -
N/A
app pub date -
Mar 30, 2015
filing date -
Mar 31, 2014
priority date (Note) -
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Abstract
A polishing device is provided to suppress deterioration in reproducibility of a polishing profile due to a variation or change with time of a shape of a retaining ring of a substrate holding member for each of retaining rings. The polishing device includes: a polishing head configured to press a substrate against a polishing pad and have a retainer ring surrounding the substrate pressed against the polishing pad; a measurement sensor configured to measure a surface shape of the retainer ring; and a controller configured to determine a polishing condition of the substrate based on the surface shape of the retainer ring measured by the measurement sensor.
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