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Abstract

This refers to a magnetron ion bombardment process, with which it is possible to pulverize the surface material of a target such that the pulverized material is present in a high percentage in the form of ions. In accordance with this, this is achieved by a simple generator, whose power is distributed over time intervals in several magnetron sources of ionic bombardment, that is, an ionic bombardment source is fed over a time interval with maximum power, and the Next source of ionic bombardment is fed with maximum power in the subsequent time interval. In this way, discharge current densities greater than 0.2 A / cm2 are achieved. During the disconnected time the ionic bombardment objective has the possibility of cooling, so as not to exceed the limit temperature.

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