Photomask blank, preparation method and photomask

China Patent

PATENT NO 106547167
APP PUB NO CN-106547167-A
SERIAL NO

201610824947

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Photomask blank, method of manufacture and photomask. A photomask blank comprising a transparent substrate (1), an etching stopper film (2), a light-shielding film (3) and an etching mask film (4), has a reflectance of at most 35% with respect to exposure light on the substrate side. The etching stopper film (2) is composed of a first layer (21) which is provided adjacent to the substrate and serves as an antireflection layer, and a second layer (22) which serves as a fluorine-based dry etching resistant layer, one of the first and second layers being a layer having a compressive stress and the other being a layer having a tensile stress.

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