METHOD FOR PRODUCING PICTORIAL RELIEF STRUCTURES

European Patent Office Patent

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Abstract

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The invention relates to a method for producing pictorial relief structures on a layer construction. The method comprises the provision of a layer construction having a substrate layer. Subsequently, at least one fluid containing at least one first reactive component is applied pictorially onto the substrate, wherein the pictorial application occurs in the form of a plurality of droplets with a droplet volume of less than 2 µl, and wherein the droplets are positioned pictorially. After this, there is an at least partial diffusing of the at least one first reactive component into the substrate layer for a predefined exposure time and/or an at least partial diffusing of at least one second reactive component into the pictorially positioned droplets of fluid for a predefined exposure time, wherein the substrate layer comprises the at least one second reactive component. The created relief is then fixed under the influence of heat and/or radiation via a reaction involving the first reactive component and/or the second reactive component. The invention also relates to a pictorial relief structure produced according to the method, and to the use of the pictorial relief structure as a printing form, as a microfluidic component, as a microreactor, as a phoretic cell, as a light-controlling element for colour representation, as photonic crystals or as flexible parts of items of clothing.

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Patent Owner(s)

Patent OwnerAddress
FLINT GROUP GERMANY GMBHDE70469 STUTTGART

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Inventor(s)

Inventor Name Address
TELSER THOMAS 69123 HEIDELBERG-WIEBLINGEN
BEYER MATTHIAS 69469 WEINHEIM
MAY CLAUDIA 77731 WILLSTÄTT
FLEISCHER DANIEL 77866 RHEINAU

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