METHOD FOR PRODUCING PICTORIAL RELIEF STRUCTURES
European Patent Office Patent
Stats

Importance

EP Family Size
|
Non-US Coverage
|
Abstract
The invention relates to a method for producing pictorial relief structures on a layer construction. The method comprises the provision of a layer construction having a substrate layer. Subsequently, at least one fluid containing at least one first reactive component is applied pictorially onto the substrate, wherein the pictorial application occurs in the form of a plurality of droplets with a droplet volume of less than 2 µl, and wherein the droplets are positioned pictorially. After this, there is an at least partial diffusing of the at least one first reactive component into the substrate layer for a predefined exposure time and/or an at least partial diffusing of at least one second reactive component into the pictorially positioned droplets of fluid for a predefined exposure time, wherein the substrate layer comprises the at least one second reactive component. The created relief is then fixed under the influence of heat and/or radiation via a reaction involving the first reactive component and/or the second reactive component. The invention also relates to a pictorial relief structure produced according to the method, and to the use of the pictorial relief structure as a printing form, as a microfluidic component, as a microreactor, as a phoretic cell, as a light-controlling element for colour representation, as photonic crystals or as flexible parts of items of clothing.

First Claim
Family

- 15 United States
- 10 France
- 8 Japan
- 7 China
- 5 Korea
- 2 Other
Country Designations

Patent Owner(s)
Patent Owner | Address |
---|---|
FLINT GROUP GERMANY GMBH | DE70469 STUTTGART |
International Classification(s)

- [Classification Symbol]
- [Patents Count]
Inventor(s)
Inventor Name | Address |
---|---|
TELSER THOMAS | 69123 HEIDELBERG-WIEBLINGEN |
BEYER MATTHIAS | 69469 WEINHEIM |
MAY CLAUDIA | 77731 WILLSTÄTT |
FLEISCHER DANIEL | 77866 RHEINAU |
Cited Art Landscape
- No Cited Art to Display

Full Text

Legal Events

Matter Detail

Renewals Detail

Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:

Add to additional portfolios:

Note
The template below is formatted to ensure compatibility with our system.
Provide tags with | separated like (tags1|tags2).
Maximum length is 128 characters for Customer Application No
Mandatory Fields * - 'MatterType','AppType','Country','Title','SerialNo'.
Acceptable Date Format - 'MM/DD/YYYY'.
Acceptable Filing/App Types -
- Continuation/Divisional
- Original
- Paris Convention
- PCT National
- With Priority
- EP Validation
- Provisional Conversion
- Reissue
- Provisional
- Foreign Extension
Acceptable Status -
- Pending
- Abandoned
- Unfiled
- Expired
- Granted
Acceptable Matter Types -
- Patent
- Utility Model
- Supplemental Protection Certificate
- Design
- Inventor Certificate
- Plant
- Statutory Invention Reg
Advertisement
Advertisement
Advertisement

Recipient Email Address

Recipient Email Address

Comment
Recipient Email Address

Success
E-mail has been sent successfully.
Failure
Some error occured while sending email. Please check e-mail and try again!
Important Notes on Latency of Status data
This Status indicator is an estimation based on the relevant document kind code. As such, it status will only indicate "Published" or "Granted". Expired, lapsed or abandoned statuses are not available in this release. Please refer to the legal status information for more information.
This status should not be taken as legal conclusion. No representations are made as to the accuracy of the status provided. Please consult a legal professional before relying on this status information.
Important Note on Priority Date data
This priority date is an estimated earliest priority date and is purely an estimation. This date should not be taken as legal conclusion. No representations are made as to the accuracy of the date listed. Please consult a legal professional before relying on this date.
Only for Granted EP cases
EP validations represent the countries in which the EP patent may be in force. Data is based on reporting from the various EP contracting states. The reporting consistency can vary across the countries.