Method and apparatus for film deposition
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United States of America Patent
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Oct 7, 2008
Grant Date -
Oct 24, 2002
app pub date -
Feb 20, 2002
filing date -
Feb 21, 2001
priority date (Note) -
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Abstract
Provided is a method and apparatus for depositing an organic compound layer having a plurality of function regions. A plurality of evaporation sources are provided within a deposition chamber. Function regions of respective organic compounds can be continuously formed and a mixed region be formed in an interface between the function regions. Meanwhile, a light source is provided in a deposition chamber to perform deposition while irradiating light to an anode surface, thereby forming a compact organic compound layer.
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