Sputtering target for producing electroconductive transparent films and process for manufacture thereof
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United States of America Patent
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Nov 3, 1992
Grant Date -
N/A
app pub date -
May 16, 1989
filing date -
May 16, 1988
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A sputter target for producing electroconductive transparent films, which comprises indium oxide and tin oxide and having a shape such that not less than 80% by weight of the target is present in an erosion area on sputtering, and a process for manufacturing the sputtering target which comprises molding a slurry or a powder mixture containing indium oxide and tin oxide into a molded shape and sintering the molded shape are disclosed.
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