Method for forming a coating film on a plate-like workpiece
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United States of America Patent
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Nov 27, 2007
Issued Date -
N/A
app pub date -
Aug 9, 2004
filing date -
Jan 27, 2000
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Abstract
A method for forming a coating film, comprises the steps of: applying a raw material of a low dielectric constant onto a surface of a plate-like material; reducing oxygen concentration in the atmosphere surrounding the plate-like material to be less than or equal to 1% before a surface temperature of said plate-like material to be treated rises to 200.degree. C.; thereafter heating said plate-like material to a temperature greater than or equal to 400.degree. C.; and then maintaining the oxygen content in the atmosphere to be less than or equal to 1% until the surface temperature of said plate-like material to be treated lowers to 200.degree. C. The raw material is an organic SOG obtained by hydrolyzing and condensing at least one alkoxysilane compound into an organic solvent under an acid catalyst.
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