Chemical amplification type resist composition
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United States of America Patent
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May 22, 2007
Grant Date -
Mar 18, 2004
app pub date -
Sep 9, 2003
filing date -
Sep 12, 2002
priority date (Note) -
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Abstract
The present invention provides a chemical amplification type positive resist composition comprising a nitrogen containing compound of the formula (VIa) or (VIb); ##STR00001## resin which contains a structural unit having an acid labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid; and an acid generator of the formula (I) ##STR00002##
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