Symmetric plasma process chamber

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 11315760
APP PUB NO 20200185192A1
SERIAL NO

16791947

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Abstract

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Embodiments of the present invention provide a plasma chamber design that allows extremely symmetrical electrical, thermal, and gas flow conductance through the chamber. By providing such symmetry, plasma formed within the chamber naturally has improved uniformity across the surface of a substrate disposed in a processing region of the chamber. Further, other chamber additions, such as providing the ability to manipulate the gap between upper and lower electrodes as well as between a gas inlet and a substrate being processed, allows better control of plasma processing and uniformity as compared to conventional systems.

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Patent Owner(s)

  • APPLIED MATERIALS INC.

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Balakrishna, Ajit Santa Clara, US 60 1066
Buchberger,, Jr Douglas A Livermore, US 91 2541
Carducci, James D Sunnyvale, US 109 3551
Chen, Zhigang Campbell, US 136 2293
Collins, Kenneth S San Jose, US 308 25066
Nguyen, Andrew San Jose, US 277 16713
Ramaswamy, Kartik San Jose, US 347 17257
Rauf, Shahid Pleasanton, US 149 4867
Tavassoli, Hamid Cupertino, US 36 898

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