Patterned medium, method for fabricating same and method for evaluating same
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United States of America Patent
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Apr 17, 2007
Grant Date -
Jun 30, 2005
app pub date -
May 6, 2004
filing date -
Dec 26, 2003
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A process for fabricating a patterned medium including a dot-forming step for forming a dot array constituted by sample magnetic dots having a predetermined size such as a single domain particle size determined theoretically from the magnetic metal thin for a sample medium having a magnetic metal film formed with the initial conditions; a demagnetization step for AC-demagnetizing the dot array; a ratio measurement step for measuring the ratio of single magnetic domains by observing the magnetic pattern of each of the sample dots after the AC-demagnetization; and an adjustment step for determining conditions of the sputtering apparatus for forming a solid state magnetic metal thin film by adjusting the film-forming conditions such that the ratio of the single magnetic domains equals to or exceeds a predetermined value.
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