Methods of finishing quartz glass surfaces and components made by the methods
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United States of America Patent
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Jul 31, 2007
Grant Date -
Dec 2, 2004
app pub date -
May 30, 2003
filing date -
May 30, 2003
priority date (Note) -
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Abstract
Methods of surface finishing a component useful for a plasma processing apparatus are provided. The component includes at least one plasma-exposed quartz glass surface. The method includes mechanically polishing, chemically etching and cleaning the plasma-exposed surface to achieve a desired surface morphology. Quartz glass sealing surfaces of the component also can be finished by the methods. Plasma-exposed surface and sealing surfaces of the same component can be finished to different surface morphologies from each other.
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