Projection exposure apparatus and method
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United States of America Patent
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Mar 23, 2004
Grant Date -
Mar 6, 2003
app pub date -
Jul 25, 2002
filing date -
Nov 15, 1990
priority date (Note) -
Expired
status (Latency Note)
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Abstract
An exposure apparatus and method to expose an object with an illumination beam irradiated on a mask from a light source disposes an optical unit between the light source and an optical integrator of an illumination optical system to illuminate the mask with an illumination beam, of which an intensity distribution on a Fourier transform plane with respect to a pattern on the mask has an increased intensity portion apart from the optical axis relative to a portion of the intensity distribution on the optical axis.
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