Magnetic tunnel junction memory cell with a buffer-layer and methods for forming the same

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United States of America Patent

PATENT NO 11844285
SERIAL NO

17073591

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Abstract

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A memory cell structure including a dielectric cap layer disposed over a substrate and a first dielectric layer disposed over the dielectric cap layer. The memory cell structure may further include a buffer layer disposed over the first dielectric layer, a connection via structure embedded in the buffer layer, the first dielectric layer, and the dielectric cap layer. The memory cell structure may further include may further include a bottom electrode disposed on the connection via structure and the buffer layer, and a magnetic tunnel junction (MTJ) memory cell including one or more MTJ layers disposed on the bottom electrode.

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Patent Owner(s)

Patent OwnerAddress
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LIMITEDNO 8 LI-HSIN 6 ROAD HSINCHU SCIENCE PARK HSINCHU ROC 30077

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hsu, Chern-Yow Chu-Bei, TW 134 727

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