Electromagnetic alignment and scanning apparatus
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Mar 14, 2006
Issued Date -
N/A
app pub date -
Nov 15, 2004
filing date -
Jun 27, 1994
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A scanning exposure method moves a mask stage in a scanning direction by a driver having a first portion coupled to the mask stage, which includes a reflective portion positioned along the scanning direction. A counter weight having at least one beam extending along the scanning direction, moves in a direction opposite to the mask stage in response to a reaction force generated by movement of the mask stage by the driver. The at least one beam of the counter weight is coupled to a second portion of the driver. The counter weight is movably supported via a first bearing by a base member. The movement of the counter weight is guided in the scanning direction via a second bearing by a guide mounted on the base member and extending along the scanning direction. A length of the guide is longer than a length of the reflective portion.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully