Glyph rendering

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United States of America Patent

PATENT NO 8553032
SERIAL NO

13304119

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Techniques are provided for glyph rendering based on a polygon mesh having vertices located away from a glyph's outline. Skeletonisation may be used to establish polygonal skeletons in the interior region of a glyph and in the outside region of the glyph. Transepts oriented away from the glyph's outline may be generated for nodes on the glyph's outline. A polygon mesh may be generated with vertices constrained to be selected from a set of candidate vertices comprising termination points of transepts, skeleton nodes, and/or points on the glyph's bounding boxes. Implicit forms may be determined from curves or lines representing segments of the glyph's outline, without use of Bézier control points and endpoints. These implicit forms along with tessellation data may be provided to a computing device as glyph rendering data for rendering the glyph at runtime.

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Patent Owner(s)

  • ANIMOTO, INC.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Poston, Timothy Singapore, SG 41 2025

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