Heat treatment method and heat treatment apparatus of light irradiation type
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United States of America Patent
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Nov 2, 2021
Grant Date -
Jul 30, 2020
app pub date -
Dec 3, 2019
filing date -
Jan 28, 2019
priority date (Note) -
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Abstract
After treatment of a preceding lot is completed, warm up treatment is started. In the warm up treatment, an in-chamber structure such as a susceptor is kept at a constant heat-retaining temperature by light irradiation from a halogen lamp. When a signal to pay out a lot is received while the warm up treatment is performed, the treatment proceeds to conditioning treatment. In the conditioning treatment, the in-chamber structure like the susceptor and so on is temperature-controlled to a stable temperature by repeatedly performing light irradiation on a dummy wafer held on the susceptor, the light irradiation being similar to that performed on a semiconductor wafer included in a lot to be treated. Performing the conditioning treatment after the warm up treatment is performed enables the in-chamber structure to be temperature-controlled to the stable temperature in a short time.
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