Cell row arrangement in regions of integrated circuit layout

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United States of America Patent

PATENT NO 11256844
APP PUB NO 20210240901A1
SERIAL NO

17025296

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Abstract

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A method of generating a layout design of an integrated circuit. The method includes forming a first region having at least two first-type cell rows extending in a first direction. Each one of the first-type cell rows has a first row height measured along a second direction perpendicular to the first direction. The method also includes forming a second region having at least two second-type cell rows extending in the first direction. Each one of the second-type cell rows has a second row height measured along the second direction. The first region is adjacent to the second region, and the first row height of the first-type cell rows is different from the second row height of the second-type cell rows.

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Patent Owner(s)

  • TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chen, Wen-Hao Hsinchu, TW 104 611
Ku, Chun-Yao Hsinchu, TW 18 29
Yu, Ming-Tao Hsinchu, TW 13 18

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