Light irradiation control method for projection exposure apparatus
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United States of America Patent
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-
Nov 25, 1986
Issued Date -
N/A
app pub date -
Oct 28, 1985
filing date -
Sep 17, 1983
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A control method for the projection optical system of a projection exposure apparatus used in the fabrication of LSIs. The amount of energy incident to the projection optical system during each unit time is maintained constant at all times including each projection and the intervals between the projection operations. This has the effect of cancelling any error in the projected image, particularly any variation of the magnification error with time due to any variation of the optical performance of the projection optical system caused by the illuminating energy.
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