Positive resist compositions and patterning process
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United States of America Patent
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Dec 29, 2009
Grant Date -
May 29, 2008
app pub date -
Nov 29, 2007
filing date -
Nov 29, 2006
priority date (Note) -
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Abstract
A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid and (B) an acid generator. The resin (A) is a polymer comprising specific recurring units. When processed by ArF lithography, the composition is improved in resolution and forms a pattern with a minimal line edge roughness.
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