Optical system, in particular projection-illumination unit used in microlithography
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United States of America Patent
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Oct 23, 2001
Grant Date -
N/A
app pub date -
Nov 22, 1999
filing date -
Dec 23, 1998
priority date (Note) -
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Abstract
An optical system, in particular for projection-illumination units used in microlithography, in particular with a slot-shaped field of view or non-rotationally symmetrical illumination, has an optical element 1, in particular a lens or a mirror, which is arranged in a mount 7 or an inner ring 2, and actuators 8a, 8b and 9a, 9b. A plurality of actuators 8a, 8b and 9a, 9b act on the deformable inner ring 2 via a radial force-displacement transmission 12, 13 in order to generate tensile and/or compressive forces.
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