Illumination system for illuminating a patterning device and method for manufacturing an illumination system
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United States of America Patent
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Feb 15, 2011
Grant Date -
Oct 9, 2008
app pub date -
Apr 3, 2007
filing date -
Apr 3, 2007
priority date (Note) -
Expired
status (Latency Note)
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Abstract
An illumination system includes a housing, and an optical system located within the housing. The optical system includes at least one optical element. The optical system is constructed and arranged to illuminate a patterning device with a radiation beam diverging from an intermediate focus. The intermediate focus is located at a position substantially at the same level or below a bottom portion of the illumination system.
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