Self-aligned shallow trench isolation and doping for vertical fin transistors

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United States of America Patent

PATENT NO 10593803
APP PUB NO 20180358459A1
SERIAL NO

16053123

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A method of forming a vertical fin field effect transistor (vertical finFET) with a self-aligned shallow trench isolation region, including forming a pinch-off layer on one or more vertical fin segments, wherein the pinch-off layer has a thickness on the sidewalls of the one or more vertical fin segments, forming a trench mask layer on predetermined portions of the pinch-off layer, removing portions of the pinch-off layer not covered by the trench mask layer, where the removed portions of the pinch-off layer exposes underlying portions of the substrate, and removing at least a portion of the substrate to form one or more isolation region trenches, where the distance of the sidewall of one of the one or more isolation region trenches to an adjacent vertical fin segment is determined by the thickness of the pinch-off layer.

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Patent Owner(s)

  • IBM CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Anderson, Brent A Jericho, US 534 6633
Lie, Fee Li Albany, US 177 992
Wang, Junli Slingerlands, US 492 2761

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