Lithographic apparatus, device manufacturing method and device manufactured thereby
Number of patents in Portfolio can not be more than 2000
United States of America Patent
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May 10, 2011
Grant Date -
Dec 24, 2009
app pub date -
May 26, 2009
filing date -
Aug 24, 2000
priority date (Note) -
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Abstract
The X, Y and Rz positions of a mask stage are measured using two optical encoder-reading heads measuring displacements of respective grid gratings mounted on the mask stage. The grid gratings are preferably provided on cut-away portions of the mask table so as to be coplanar with the pattern on the mask itself. Measurements of the table position in the other degrees of freedom can be measured with capacitive or optical height sensors.
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