Plasma processing apparatus

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 11984300
APP PUB NO 20200373130A1
SERIAL NO

16877853

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A plasma processing apparatus includes a chamber; a wall member; an insulating member; and a ground member. The wall member is partially placed in an internal space of the chamber and exposed to a space at an outside of the chamber. The insulating member is provided on the wall member. The ground member is made of silicon, provided in the internal space and mounted on the insulating member. The wall member is configured to support the ground member in a non-contact state with the insulating member therebetween. The ground member is in contact with a spherical surface of the insulating member and mounted on the spherical surface.

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Patent Owner(s)

  • TOKYO ELECTRON LIMITED

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Sasaki, Yasuharu Miyagi, JP 95 1793
Tanikawa, Takehiro Miyagi, JP 18 813
Uchida, Yohei Miyagi, JP 35 566
Yamabe, Shuhei Miyagi, JP 7 9

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