In situ nucleation for nanocrystalline diamond film deposition

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United States of America Patent

PATENT NO 11946134
APP PUB NO 20230235452A1
SERIAL NO

17585755

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Abstract

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Methods of depositing a nanocrystalline diamond film are described. The method may be used in the manufacture of integrated circuits. Methods include treating a substrate with a mild plasma to form a treated substrate surface, incubating the treated substrate with a carbon-rich weak plasma to nucleate diamond particles on the treated substrate surface, followed by treating the substrate with a strong plasma to form a nanocrystalline diamond film.

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Patent Owner(s)

  • APPLIED MATERIALS INC.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Mallick, Abhijit Basu Sunnyvale, US 249 10305
Sahmuganathan, Vicknesh Singapore, SG 8 0
Sudijono, John Singapore, SG 60 452
Tan, Sze Chieh Singapore, SG 3 0
Venkatasubramanian, Eswaranand Santa Clara, US 49 626

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