Lithographic apparatus and a method of operating the apparatus

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United States of America Patent

PATENT NO 11187991
APP PUB NO 20160011522A1
SERIAL NO

14858885

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Abstract

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A lithographic projection apparatus is disclosed that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the table, or (iii) a surface of the shutter member, or (iv) a combination selected from (i)-(iii). The surface of the shutter member may adjoin and be co-planar with a surface of the table. The surfaces of the shutter member and the table may be spaced apart by a gap. The fluid extraction system may be configured to remove liquid from the gap.

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First Claim

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Patent Owner(s)

  • ASML NETHERLANDS B.V.

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Cloin, Christian Gerardus Norbertus Hendricus Marie Gennep, NL 4 14
Elisseeva, Olga Vladimirovna Waalre, NL 6 25
Eummelen, Erik Henricus Egidius Catharina Eindhoven, NL 37 158
Gunther, Tijmen Wilfred Mathijs Utrecht, NL 4 19
Kemper, Nicolaas Rudolf Eindhoven, NL 95 1630
Riepen, Michel Veldhoven, NL 87 999
Stavenga, Marco Koert Eindhoven, NL 69 1160
Ten, Kate Nicolaas Almkerk, NL 156 902
Van, Der Wekken Michaël Christiaan Eindhoven, NL 2 14

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