Device for controlling trapped ions and method of manufacturing the same

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 11984416
APP PUB NO 20220102301A1
SERIAL NO

17488388

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Abstract

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A device for controlling trapped ions includes a first semiconductor substrate. A second semiconductor substrate is disposed over the first semiconductor substrate. At least one ion trap is configured to trap ions in a space between the first semiconductor substrate and the second semiconductor substrate. A spacer is disposed between the first semiconductor substrate and the second semiconductor substrate, the spacer including an electrical interconnect which electrically connects a first metal layer structure of the first semiconductor substrate to a second metal layer structure of the second semiconductor substrate.

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Patent Owner(s)

  • INFINEON TECHNOLOGIES AUSTRIA AG

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Auchter, Silke Villach, AT 3 1
Gruber, Martin Schwandorf, DE 69 174
Roessler, Clemens Villach, AT 7 1
Roessler, Johanna Elisabeth Villach, AT 5 1

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