Method for manufacturing a phase shift photomask
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United States of America Patent
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Jan 28, 2003
Grant Date -
N/A
app pub date -
Sep 21, 2000
filing date -
Nov 5, 1999
priority date (Note) -
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Abstract
A method for fabricating a phase shift photomask (10) includes providing a photomask (12) having a substantially opaque layer (16) on a surface (14) of a substantially transparent substrate (18). The opaque layer (14) includes a removed portion to define a light transmitting pattern (20) of the photomask (12). The method also includes depositing an implant (22) in a portion of the substrate (18). The implanted portion (24) of the substrate (18) includes an etch rate different than an etch rate of an unimplanted portion (32) of the substrate (18). The method includes initiating an etch of the substrate (18) corresponding to the light transmitting pattern (20) and monitoring a rate of the etch. The method further includes terminating the etch in response to detecting a change in the rate of the etch.
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