Method to compensate for non-uniform film growth during chemical vapor deposition
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United States of America Patent
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Mar 28, 2000
Issued Date -
N/A
app pub date -
May 8, 1998
filing date -
Feb 22, 1996
priority date (Note) -
Expired
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Abstract
An apparatus for heating, according to a predetermined heating profile, a surface carrying a film. The invention includes a source of radiant energy. The source of radiant energy has several peak wavelengths, with each peak wavelength having a unique absorption profile related to the thickness of the film. The source of radiant energy is positioned to direct radiant energy toward the surface. Means are included for holding the source of radiant energy in a manner such that the combination of peak wavelengths produce the desired predetermined heating profile.
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