Plasma processing apparatus
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United States of America Patent
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Feb 1, 2005
Grant Date -
Mar 27, 2003
app pub date -
Aug 21, 2002
filing date -
Sep 11, 2001
priority date (Note) -
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status (Latency Note)
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Abstract
Induction coils of an induction coupling type plasma processing apparatus are divided into a plurality of coil elements and a plurality of lead wire portions for effecting connection between the coil elements. The coil elements are disposed inside of a process chamber, while the lead wire portions which effect connection between the coil elements are disposed outside of the process chamber. The coil elements disposed in the process chamber are in the form of short arcs as a result of the division thereof, so that they can be easily arranged symmetrically with respect to the center of the process chamber, whereby a uniform plasma distribution can be easily achieved.
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