Preparation of photomask blank and photomask

United States of America Patent

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Apr 7, 2009
Grant Date
Nov 24, 2005
app pub date
May 17, 2005
filing date
May 18, 2004

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Abstract

. A photomask is prepared by forming a resist pattern on the photomask blank by photolithography, etching away those portions of the light-absorbing film which are not covered with the resist pattern, and removing the resist.

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Patent Owner(s)

SHIN-ETSU CHEMICAL CO., LTD.

International Classification(s)

G03F:PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNE....

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Inventor Name	Address	# of filed Patents	Total Citations
Fukushima, Noriyasu	Joetsu , JP	9	129
Kaneko, Hideo	Joetsu , JP	94	423
Yoshikawa, Hiroki	Joetsu , JP	138	1463

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Preparation of photomask blank and photomask

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United States of America Patent

11130278

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PATENT NO	7514185
APP PUB NO	20050260505A1
SERIAL NO	11130278
DOCKET NO

US Family Size	Non-US Coverage
Patent Longevity	Forward Citations

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
April 07, 2009	US,7514185,B2 US7514185B2	GRANTED PATENT AS SECOND PUBLICATION
November 24, 2005	US,20050260505,A1 US20050260505A1	FIRST PUBLISHED PATENT APPLICATION

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11130278

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