Apparatus for measuring feature widths on masks for the semiconductor industry
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United States of America Patent
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May 20, 2008
Grant Date -
Apr 21, 2005
app pub date -
Sep 17, 2004
filing date -
Sep 23, 2003
priority date (Note) -
In Force
status (Latency Note)
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Abstract
An apparatus for measuring feature widths on masks 1 for the semiconductor industry is disclosed. The apparatus encompasses a carrier plate 16 that is retained in vibrationally decoupled fashion in a base frame 14; a scanning stage 18, arranged on the carrier plate 16, that carries a mask 1 to be measured, the mask 1 defining a surface 4; and an objective 2 arranged opposite the mask 1. A liquid 25 is provided between the objective 2 and the surface 4 of the mask 1.
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