Etching isolation features and dense features within a substrate

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United States of America Patent

PATENT NO 11398387
APP PUB NO 20210358757A1
SERIAL NO

17298931

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Abstract

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Systems and methods for etching different features in a substantially equal manner are described. One of the methods includes applying a low frequency bias signal during a low TCP state and applying a high frequency bias signal during a high TCP state. The application of the low frequency bias signal during the low TCP state facilitates generation of hot neutrals, which are used to increase an etch rate of etching dense features compared to an etch rate for etching isolation features. The application of the high frequency bias signal during the high TCP state facilitates generation of ions to increase an etch rate of etching the isolation features compared to an etch rate of etching the dense features. After applying the low frequency bias signal during the low TCP state and the high frequency bias signal during the high TCP state, the isolation and dense features are etched similarly.

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Patent Owner(s)

  • LAM RESEARCH CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Paterson, Alexander Miller San Jose, US 22 69
Shoeb, Juline Fremont, US 18 98
Wu, Ying Livermore, US 170 2096

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