Method of manufacturing a mother matrix
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United States of America Patent
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-
Oct 2, 1984
Grant Date -
N/A
app pub date -
Oct 14, 1983
filing date -
Oct 14, 1982
priority date (Note) -
Expired
status (Latency Note)
Importance
Abstract
A method of manufacturing a metal mother matrix in which a master disk, which is a supporting disk, carrying on one side a layer of a positive photoresist in which an information track is provided, is provided with a metal peel, first by electroless deposition and then by electrodeposition, the metal peel is separated from the master disk, the remainders of the photoresist present on the father matrix thus obtained are dissolved and a metal copy, which is a mother matrix, is manufactured by electrodeposition from the father matrix, characterized in that the photoresist is made electrically conductive by means of exposure to light.
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