Selectable area laser assisted processing of substrates
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United States of America Patent
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Aug 7, 2007
Issued Date -
N/A
app pub date -
Oct 28, 2003
filing date -
Oct 28, 2002
priority date (Note) -
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Abstract
A system and method for selectable area laser treatment of a substrate, such as thin film transistors, the system including a holder holding a substrate in proximity to reactant, and laser beams each addressing independently selectable mutually set apart locations on the substrate to induce a reaction between the substrate and the reactant.
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