Photoresist baking apparatus

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United States of America Patent

PATENT NO 10656525
APP PUB NO 20190072852A1
SERIAL NO

16025235

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ATTORNEY / AGENT: (SPONSORED)

Importance

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Abstract

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A photoresist baking apparatus is provided. The photoresist baking apparatus comprises a baking chamber including an inlet, an outlet and a cover sealed connected thereon. The cover is applied to guide the hot air entering the baking chamber and includes a heating device for maintaining the temperature of the hot air. The heating device is disposed on the cover for heating the hot air flowing to the cover and maintaining the temperature of the hot air to be consistent when the hot air flowing to the outlet, thereby to prevent from the photoresist volatile condensing and dripping due to decreased temperature after the photoresist volatile contacting the cover and affecting the product quality, and to guarantee the temperature homogeneity inside the baking chamber.

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Patent Owner(s)

Patent OwnerAddress
SHENZHEN CHINA STAR OPTOELECTRONICS SEMICONDUCTOR DISPLAY TECHNOLOGY CO LTDNO 9-2 TANGMING RD GONGMING STREET GUANGMING NEW DISTRICT SHENZHEN GUANGDONG 518132

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chen, Chung-jen Guangdong, CN 34 505
Li, Yan-ze Guangdong, CN 3 1
Lin, Ming-wen Guangdong, CN 1 1
Wu, Chilin Guangdong, CN 2 1
Wu, Zhikun Guangdong, CN 12 2

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