Exposure method for forming pattern for IC chips on reticle by use of master masks
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Apr 18, 2006
Grant Date -
Oct 31, 2002
app pub date -
Apr 9, 2002
filing date -
Apr 9, 2001
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
There is provided a method which forms master masks used when a pattern of size larger than a region which can be exposed at one time is exposed on a to-be-exposed object. The pattern of the size larger than the region which can be exposed at one time is divided into a region of low repetitiveness and a region of high repetitiveness. A pattern of the region of low repetitiveness is drawn on at least one first master mask. Further, a pattern of the region of high repetitiveness is drawn on at least one second master mask.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully