Substrate processing apparatus and substrate processing method

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United States of America Patent

PATENT NO 11400480
APP PUB NO 20210213480A1
SERIAL NO

15999797

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Abstract

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In a substrate processing apparatus, neutralization processing is performed on a substrate by a neutralization device provided in a thermal processing section. In the neutralization device, at least one of a holder that holds the substrate and an emitter that emits vacuum ultraviolet rays is moved relative to another one in one direction. At this time, one surface of the substrate is irradiated with the vacuum ultraviolet rays emitted by the emitter. When the entire one surface of the substrate is irradiated with the vacuum ultraviolet rays, the neutralization processing ends. Thereafter, the substrate on which the neutralization processing has been performed is transported to a coating processing unit in a coating processing section. In the coating processing unit, a film of a processing liquid is formed on the one surface of the substrate on which the neutralization processing has been performed.

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Patent Owner(s)

  • SCREEN HOLDINGS CO., LTD.

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Mitsuhashi, Tsuyoshi Kyoto, JP 52 717
Miyagi, Tadashi Kyoto, JP 53 719
Wajiki, Takehiro Kyoto, JP 3 3

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