Method for measuring temperature of process area

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United States of America

PATENT NO 10605665
APP PUB NO 20190128738A1
SERIAL NO

15800045

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Abstract

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A method for measuring a temperature of a process area is provided. A simulation computation is performed to obtain a simulation temperature. A ratio-pyrometer with two one-color modes is used to measure the temperature of the process area, and a first emissivity value and a second emissivity value are acquired. An emissivity ratio is set to a ratio of the second emissivity value to the first emissivity value, and the ratio-pyrometer in the two-color mode is used to measure the temperature of the process area.

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Patent Owner(s)

  • NATIONAL CHENG KUNG UNIVERSITY; NATIONAL CHUNG-SHAN INSTITUTE OF SCIENCE & TECHNOLOGY

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Lo, Yu-Lung Tainan, TW 33 136
Ren, Chi-Guang Hsinchu, TW 1 9

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