Method for adusting a first element of a lithography apparatus towards a second element of a lithography apparatus by a tunable spacer

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United States of America Patent

PATENT NO 11460780
APP PUB NO 20210232051A1
SERIAL NO

17228150

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Abstract

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A method adjusts a first element of a lithography apparatus toward a second element of the lithography apparatus via a tunable spacer which is arranged between the first element and the second element. The method includes: determining an actual location of the first element; determining a nominal location of the first element; unloading the tunable spacer; adjusting a height of the tunable spacer to bring the first element from the actual location to the nominal location; and loading the tunable spacer.

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Patent Owner(s)

  • CARL ZEISS SMT GMBH

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Pnini, Boaz Goeggingen, DE 5 13

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