Film formation apparatus and film formation method

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 11505866
APP PUB NO 20200340117A1
SERIAL NO

16856650

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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According to one embodiment, film formation apparatus includes: a carrying unit that includes a rotation table which circulates and carries a workpiece; a film formation process unit which includes a target formed of a silicon material, and a plasma producer that produces plasma of a sputter gas introduced between the target and the rotation table, and which forms a silicon film on the workpiece by sputtering; and a hydrogenation process unit which includes a process gas introducing unit that introduces a process gas containing a hydrogen gas, and a plasma producer that produces plasma of the process gas, and which performs hydrogenation on the silicon film formed on the workpiece. The carrying unit carries the workpiece so as to alternately pass through the film formation process unit and through the hydrogenation process unit.

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Patent Owner(s)

  • SHIBAURA MECHATRONICS CORPORATION

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ito, Akihiko Yokohama, JP 186 1782
Ono, Daisuke Yokohama, JP 20 75

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