Photoresist composition, coated substrate including the photoresist composition, and method of forming electronic device

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 11960206
APP PUB NO 20230094313A1
SERIAL NO

18075594

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Abstract

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A photoresist composition, including an acid-sensitive polymer and photoacid generator compound having Formula (I):

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Patent Owner(s)

  • ROHM AND HASS ELECTRONIC MATERIALS LLC

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Aqad, Emad Northborough, US 64 213
Cameron, James F Brookline, US 107 1054
Williams,, III William Ipswich, US 10 33

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