Laser lithography system with improved bandwidth control
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United States of America Patent
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Mar 1, 2011
Grant Date -
Oct 16, 2008
app pub date -
Apr 9, 2008
filing date -
Apr 13, 2007
priority date (Note) -
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Abstract
A method and apparatus may comprise a seed laser, along with an amplifier laser amplifying the output of the seed laser. A bandwidth metrology module may provide a bandwidth measurement and a bandwidth error signal may be provided using a bandwidth set point. A differential timing system responsive to the error signal can selectively adjust a differential firing time between the seed laser and amplifier laser. A beam dimension and center wavelength control system may adjust a beam dimension, within the cavity of the seed laser, to select bandwidth, and may adjust center wavelength at the same time, using a plurality of beam expansion prisms and at least one other prism or other optical element in the cavity to select center wavelength.
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