Method for manufacturing pellicle for extreme ultraviolet lithography having graphene defect healing layer
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United States of America Patent
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Oct 17, 2023
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Dec 1, 2021
filing date -
Dec 2, 2020
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Abstract
This application relates to a method for manufacturing a pellicle for extreme ultraviolet lithography. In one aspect, the method includes forming a support layer of a silicon nitride material on a silicon substrate, and forming a core layer of a graphene material on the support layer. The method may also include forming a graphene defect healing layer on the core layer by selectively forming a material of MeOxNy (Me is one of Si, Al, Ti, Zr, and Hf, x+y=2) at a grain boundary of the core layer in an atomic layer deposition process using heat in order to heal defects generated in graphene forming the core layer without additional damage to the graphene. The method may further include a capping layer on the graphene defect healing layer, wherein a central portion of the silicon substrate under the support layer is removed to form an opening partially exposing the support layer.
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- 15 United States
- 10 France
- 8 Japan
- 7 China
- 5 Korea
- 2 Other
Patent Owner(s)
- KOREA ELECTRONICS TECHNOLOGY INSTITUTE
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Inventor(s)
Inventor Name | Address | # of filed Patents | Total Citations |
---|---|---|---|
Cho, Jin Woo | Seoul, KR | 55 | 341 |
Jeon, Jun Hyeok | Suwon-si, KR | 1 | 0 |
Kim, Hyeong Keun | Yongin-si, KR | 24 | 346 |
Kim, Hyun Mi | Seoul, KR | 36 | 119 |
Kim, Seul Gi | Yongin-si, KR | 45 | 147 |
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