Lift thimble system, reaction chamber, and semiconductor processing equipment

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 11694880
APP PUB NO 20210313157A1
SERIAL NO

17263078

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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The present disclosure discloses a lift thimble system, a reaction chamber, and semiconductor processing equipment, including a wafer thimble device configured to lift a wafer from a base by rising or drop the wafer onto the base by descending, and a focus ring thimble device configured to lift a focus ring from an initial position of the focus ring by rising to cause an inner ring area of an upper surface of the focus ring to lift an edge area of the wafer, or cause the focus ring to return to the initial position by descending. The technical solutions of the system, the reaction chamber, and the equipment of the present disclosure improve maintenance efficiency of an abnormal situation, and double the service lifetime of the focus ring. Moreover, the technical solutions may further realize replacement of the focus ring without damaging reaction chamber vacuum to improve efficiency.

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Patent Owner(s)

  • BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Mao, Xingfei Beijing, CN 7 0

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